Patent Attorney
TEL |
+82-2-6386-6632 |
E-MAIL |
hyungwon.chae@leekoip.com |
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Since 2008, Mr. Chae has been representing top-tier U.S. and Japanese multinational corporations and has handled their IP matters. His practice focuses on patent prosecutions and trials, patent invalidation and infringement analysis, patent prior arts search, pre-litigation patent strategy and patent litigation. He has extensive patent prosecution experience in a wide range of technology areas including: semiconductor devices and manufacturing process, display devices, image sensors, telecommunication, computer engineering, printer, medical device, circuits, business methods, video and audio processing algorism, and computer software technologies. He also prosecuted US patent applications in semiconductor devices. Mr. Chae also has handled patent disputes (invalidation and confirmation of claim scope trials, and patent infringement suits) and trade secrets disputes in the field of OLED display, LCD display, a semiconductor manufacturing process, TV network system, a semiconductor inspection device. As pre-litigation matter, he also conducted numerous patent prior arts search for technologies including semiconductor manufacturing device, image sensor, medical device, biometrics, UI in smartphone, digital image processing, toll processing device, and refrigerator. Mr. Chae joined Lee & Ko IP in 2016 and, as a partner at Lee & Ko IP, is in charge of electrical and mechanical patent practice areas, and Japanese patent prosecution matter.
学历
2015 |
University of Southern California - LL.M. |
2008 |
Seoul National University - B.S. in Electronic and Electrical Engineering |
经历
2016-Present |
Lee & Ko IP |
2016 |
Abe, Ikubo &Katayama Law Firm (Secondment) |
2008-2016 |
Kim & Chang |
主要业务方向
知识产权诉讼·判决 |
商业秘密·企业信息保护 |
知识产权战略咨询 |
职务发明 |
知识产权交易·授权 |
电·电子 |
机械 |
知识产权审议 |
美国·欧洲(知识产权申请) |
日本(知识产权申请) |
医疗保健·生命科学 |
资格/会员
Admitted to the Korean patent bar (2004) |
Admitted to the Asian Patent Attorneys Association (2016) |
语言
Korean, English and Japanese |
著作/发表
- Significant changes to Patent Act, International Law Office (2016)